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MSK® PFA Spray Gun is designed for ultra-high purity semiconductor applications, offering outstanding chemical resistance and leak-tight performance. Manufactured with a precision-molded PFA body and machined sealing areas, it ensures superior durability and reliability in demanding environments. The interior surfaces are constructed entirely of high-purity PFA, while the one-piece machined modified PTFE diaphragm and poppet enhance its resistance to corrosion and contamination, making it ideal for applications where cleanliness is essential.
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MSK® PFA Pall Rings are designed for high-purity and highly corrosive applications, offering exceptional chemical resistance and thermal stability. Made from ultra-pure PFA material, these pall rings provide excellent performance in gas-liquid separation and mass transfer processes. With chemical resistance comparable to PTFE, they are ideal for applications such as acid scrubbing, distillation, and purification, especially where ultra-clean and corrosion-resistant materials are required.
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MSK® ESD PEEK Wafer Carrier is specifically designed for the safe and efficient transfer of wafers between semiconductor process stages. Constructed from high-performance ESD-safe PEEK material, this carrier ensures that wafers are handled with the utmost care, preventing damage and contamination during transport.
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MSK® PFA Wafer Carrier is specifically designed for the safe and efficient transfer of wafers between semiconductor process stages. Constructed from high-performance PFA material, this carrier ensures that wafers are handled with the utmost care, preventing damage and contamination during transport.
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MSK® Reticle SMIF Pod is designed to ensure the safe transportation and storage of single photomasks, providing robust protection against external contamination and electrostatic damage. The pod is made from high-quality ESD-safe ABS material, specifically engineered to prevent static discharge that could potentially damage photomasks.
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MSK® PTFE Tank Cleaning Nozzle is designed for efficient cleaning in CIP systems, offering a high-performance solution for tank cleaning without the need for an external motor. The nozzle utilizes the reactionary force of the cleaning liquid to rotate, providing powerful impact cleaning.
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